AXIC BenchMark 800-III | ICP Etch and Deposition
The BenchMark 800-III defines a new concept in RIE and PECVD plasma processing systems for precise etching and deposition on substrates up to eight inches in diameter.
Learn moreSivaley carries the following Plasma Etch & Deposition systems provided by AXIC for your research and production needs.
The BenchMark 800-III defines a new concept in RIE and PECVD plasma processing systems for precise etching and deposition on substrates up to eight inches in diameter.
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The PlasmaSTAR Series from Axic, Inc. defines a new concept in barrel plasma processing. The systems are based on a modular design concept.
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