DLI Systems

Sivaley carries the following Direct Liquid Injection (DLI) systems provided by Annealsys for your research and production needs.

Annealsys MC-050 | All in one DLI system

The Annealsys MC-050 offers the widest capabilities for development of new materials including single and multi-metallic oxides as well as transition metal dichalcogenides (TMD) and other 2D materials.

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Annealsys MC-100 | Easy multi process capabilities reactor for R&D

The MC-100 has heating capability up to 800°C. It can be used for the deposition of oxides including epitaxial layers.

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Annealsys MC-200 | Climb to the 200 mm step

The MC-200 is a versatile deposition system that can perform metal organic chemical vapor deposition (MOCVD) and atomic layer deposition (ALD) inside the same process chamber.

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