RTP Systems

Sivaley carries the following Rapid Thermal Processing (RTP) systems provided by Annealsys for your research and production needs.

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Annealsys AS-Micro | Economical 3-inch Rapid Thermal Processing system

The AS-Micro can perform various rapid thermal annealing processes at atmospheric pressure or under vacuum.

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Annealsys AS-One | Rapid Thermal Processing furnace

The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes

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Annealsys AS-Master | Rapid Thermal Processing / Rapid Thermal Chemical Vapor Deposition system

The cold wall chamber in association with the pulse annealing capability is a unique solution for annealing of thermally sensitive substrates.

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Annealsys AS-Premium | Rapid thermal processing system with square chamber

The AS-Premium double side heating has been developed for annealing compound semiconductor wafers using silicon carbide coated susceptors.

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Annealsys Zenith-100 | Far and Near – Up to one hour at 2000°C

The right system for growth of graphene mono layer and rapid thermal implant annealing of silicon carbide wafers.

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